Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Tetsuro Nakasugi,Atsushi Ando,Kazuyoshi Sugihara,Yuuichiro Yamazaki,Katsuya Okumura,Akira Miura,Ichiro Mori,Takumi Ota,Ryoichi Inanami,Osamu Nagano,Noriaki Sasaki,Motosuke Miyoshi,Roxann L Engelstad

doi:10.1117/12.483607

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Tetsuro Nakasugi, Atsushi Ando + Show 11 more

https://doi.org/10.1117/12.483607

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Publication Date: Jun 13, 2003

Citations: 9

Affiliation: Toshiba (Japan), The University of Tokyo

#Proof-of-concept System #Maskless Lithography + Show 8 more

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Abstract

In order to realize SoC (System on a Chip) fabrication at low cost with quick-TAT (Turn-Around-Time) we have proposed a maskless lithography (ML2) strategy, a low-energy electron-beam direct writing (LEEBDW) system with a common character projection (CP) aperture. This paper presents a status report on our proof-of-concept (POC) system. We have developed a compact EB column consisting small electrostatic lenses and deflectors. The experimental results for our POC system indicated that the patterns corresponding to 50nm-node logic devices can be obtained with CP exposure at the incident energy of 5 keV. The technique to reduce the raw process time using a SEM function of LEEBDW system is also reported.

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