Abstract

Semiconductor dopant profiling using secondary electron imaging in a scanning electron microscope has been developed in recent years. In this letter, we show that the mechanism behind it also allows mapping of the electric potential of undoped regions. By using an unbiased GaAs/AlGaAs heterostructure, this letter demonstrates the direct observation of the electrostatic potential variation inside a 90-nm-wide undoped GaAs channel surrounded by ionized dopants. The secondary electron emission intensities are compared with two-dimensional numerical solutions of the electric potential.

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