Manufacturing technology by synchrotron radiation in NSRL

Abstract

In this paper a brief description is given to introduce the activities of the manufacturing technology using the synchrotron radiation light source in the National Synchrotron Radiation Laboratory (NSRL). The light source in NSRL is a dedicated synchrotron radiation facility in China. Five beamlines and corresponding experimental stations, including soft x-ray lithography, have been constructed. The main experimental results obtained from the soft x-ray lithography station are reported. We have fabricated some devices using the synchrotron radiation lithography, for example, the high electron mobility transistor, high T c superconductor infrared detector-array, diffraction grating, and micro condenser zone plate. A simple method for the achievement of synchrotron radiation x-ray lithography mask will also be presented. The LIGA (German abbreviation for: Lithograpie, Galvanoforming, and Abforming) technique has been developed in NSRL. It is the most promising technique for the fabrication of three-dimensional microstructures. We are successful in making several microdevices by deep x-ray lithography and microelectroforming, such as microgearwheel, micro acceleration sensor.