Abstract
In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
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