Abstract
This study explores the influence of a 316 L stainless steel substrate on growth of CoCrFeMnNi coatings deposited using magnetron sputtering at different substrate bias. The study was carried out on a polycrystalline 316 L substrate where the growth behavior of the coating could be investigated on grains with different orientations. By combining electron backscatter diffraction (EBSD) before and after deposition and characterization of the same area, it was possible to determine growth behavior and surface morphologies on individual substrate grains. No strong influence of the substrate was observed at a floating bias. At a bias of -100 V, however, the coating was strongly influenced by the orientation of the individual substrate grains. Epitaxial growth with a smooth coating grain surface was observed on the <102>-oriented grains while a more columnar growth was observed on <111>-oriented substrate grains. Furthermore, a small difference in growth rate was observed on different substrate orientations. The growth behavior could be related to differences in energy transfer from incoming ions and diffusion rates during growth on different orientations.
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