Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber: The influence of substrate bias

Abstract

In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetron reactive sputtering from a Ti target in C 2H 2/Ar plasma. The deposition rates of coatings on rubber and Si wafer were about the same. Columnar structures resulting from a rough interface were often observed in the coatings deposited on rubbers. Only at a high bias voltage of − 300 V the coating on HNBR rubber became column-free whereas a bias voltage of − 100 V could already restrain the columnar structure and thus produced dense and smooth coatings on Si wafer. A segmented morphology of the coatings on HNBR rubber is formed as a result of the large difference in thermal expansion between the coating and HNBR rubber. The crack network that separates the patches plays an important role in maintaining the coating flexibility. The size of the patches reduces with increasing bias voltage and thus the variation of deposition temperature. A high bias voltage enhances the hardness of Ti-coating and the rubber-coating adhesion, and guarantees a good tribological performance. When sliding against ø6 mm 100Cr6 steel ball counterpart, very low coefficients of friction were achieved (< 0.25 for the coated rubber versus > 1.3 for the uncoated). The Ti-DLC coating can be considered as a promising material for the enhancement of tribological performance of rubbers.