Magnetron plasma and nanotechnology

Abstract

Magnetron plasma processes involving metal atoms and clusters are reviewed. The formation of metal atoms near the cathode and their nucleation in a buffer gas flow are discussed. The flow of a buffer gas with metal clusters through a magnetron chamber disturbs the equilibrium between the buffer gas flow and clusters near the exit orifice and is accompanied by cluster attachment to the chamber walls. Cluster charging faroff the cathode, the disturbance of equilibrium between the buffer gas flow and cluster drift, and the attachment of charged clusters to the chamber walls — the factors determining the output parameters of the cluster beam escaping the magnetronchamber — are analyzed. Cluster deposition on a solid surface and on dusty plasma particles is considered.