Abstract

Giant magnetostrictive thin films are suitable to develop new micro-sensors and micro-actuators due to their superior characteristics. In this paper, the influence on magnetostriction characteristic of magnetron sputtered film by sputtering condition is described. The thin film shows large magnetostriction in Tb composition 40 at %, and magnetostriction of the film shows 702 ppm in anneal temperature 300 ◦ C.

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