Abstract
Based on the magnetorheological (MR) effect, this research proposes a kind of magnetorheological finishing (MRF) in tangential magnetic fields formed by the rotation of magnetic poles in order to achieved realtime adjustment of MR polishing pads. In this paper, monocrystalline silicon was utilised to investigate the plane polishing characteristics based on the magnetorheology in single-point dynamic magnetic fields under different process conditions. Results showed that favourable polishing effects were obtained when silicon carbide abrasive was used to polish the workpieces for 50 to 70 min with the tangential magnetic fields being 5 mm and the machining gap being 1.1 mm. Afterwards, strontium titanate ceramic substrate, monocrystalline silicon and monocrystal 6H-SiC were polished for 50 min using this technology. It was found that the surface roughness Ra of this three materials were reduced from 0.45 to 0.11 µm, from 400 to 7 nm and from 70 to 9 nm, respectively.
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