Abstract
A comparative study of the solid-state reaction (SSR) in a series of Ti/Ni multilayered films (MLF) with a bilayer period of 0.65–22.2 nm and constant Ti to Ni sublayer thickness ratio has been performed by magneto-optical (MO) spectroscopy as well as x-ray diffraction (XRD). The spectral and sublayer-thickness dependences of the MO properties of the Ti/Ni MLF were explained on the basis of the electromagnetic theory. A threshold nominal Ni-sublayer thickness of about 3 nm in the as-deposited Ti/Ni MLF is necessary for observing the equatorial Kerr effect. Such a fact is explained by the formation, by solid-state reaction, of nonmagnetic alloyed regions between pure components. The SSR in the Ti/Ni MLF caused by the low temperature annealing leads to a formation of an amorphous Ti/Ni alloy and takes place mainly in Ti/Ni MLF with “thick” sublayers. In the case of Ti/Ni MLF, MO turns out to be more sensitive in determining the thickness of the reacted zone, while XRD is more useful for the structural analysis. It was also suggested that the very thin nonreacted Ni sublayers have MO properties different from the bulk.
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