Abstract
This paper reports experimental observations of partial and reversible out-of-plane magnetization change in a thin film Ni/[Pb(Mn1/3Nb2/3)O3]0.68-[PbTiO3]0.32 (001) heterostructure. Electric-field-induced isotropic in-plane compressive strain (∼1000 ppm) eliminates the stripe domain pattern in a 60-nm-thick Ni thin film. When the electric field is removed, the stripe domains are returned to their original configurations with some domain wall pinning perturbations due to ferroelectric domain texturing. The observed domain structure change is attributed to the transition from Bloch wall to Néel wall and the broadening of the Bloch wall. This out-of-plane magnetization change does not occur in thicker (100-nm-thick) Ni thin film.
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