Abstract
Pr0.55(Ca0.65S0.35)0.45MnO3 films were deposited on (001) (La0.18Sr0.82)(Al0.59Ta0.41)O3 substrates using pulse laser deposition technique and annealed in oxygen environment at temperatures ranging from 900 to 1100 °C, respectively. X-ray diffraction data suggested that these epitaxial films show a little relaxation in lattice strain without structural change after post-annealing within this temperature range. The as-deposited film and the film annealed at 900 °C showed only insulating and weak magnetic behaviors, but the film annealed at 950 °C depicted a clear metal-insulator (M-I) transition with a strong ferromagnetic property while increased annealing temperature lead to a slight degradation in both electric and magnetic properties. Interestingly, the slightly degraded films above 950 °C showed larger magnetoresistance and electroresistance than the optimized film at 950 °C. The temperature dependence of resistance for the film annealed at 1000 °C was measured at various magnitudes of dc current, and its peak resistance was found to decrease exponentially with increasing current. From a comparison between magnetoresistance and electroresistance, we found that the resistance was suppressed equally by either the application of a 0.7 T magnetic field or a 6 mA current.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
