Abstract

Magnetic tunnel junctions (MTJs), which consisted of amorphous CoFeSiB layers, were investigated. The CoFeSiB layers were used to substitute for the traditionally used CoFe and/or NiFe layers with an emphasis given on understanding the effect of the amorphous free layer on the switching characteristics of the MTJs. CoFeSiB has a lower saturation magnetization (M/sub s/:560 emu/cm/sup 3/) and a higher anisotropy constant (K/sub u/:2 800 erg/cm/sup 3/) than CoFe and NiFe, respectively. An exchange coupling energy (J/sub ex/) of -0.003 erg/cm/sup 2/ was observed by inserting a 1.0 nm Ru layer in between CoFeSiB layers. In the Si-SiO/sub 2/-Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO/sub x//CoFeSiB 7 or CoFeSiB (t)/Ru 1.0/CoFeSiB (7-t)/Ru 60 (in nanometers) MTJs structure, it was found that the size dependence of the switching field originated in the lower J/sub ex/ using the experimental and simulation results. The CoFeSiB synthetic antiferromagnet structures were proved to be beneficial for the switching characteristics such as reducing the coercivity (H/sub c/) and increasing the sensitivity in micrometer size, even in submicrometer sized elements.

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