Abstract
A metal-organic deposition (MOD) derived Pb (Zr0.53Ti0.47)O3 thin film was patterned using magnetically enhanced reactive ion etching (MERIE) which promised a relatively high etching rate, large etch anisotropy and good selectivity for lead zirconate titanate (PZT). The etched surface of PZT thin films was investigated by X- ray photoelectron spectroscopy (XPS). It was found that PbF2, ZrF4 and polymers containing C, H and F were formed and remained on the etched surface while no titanium fluoride was formed during the etching process. The major factor that restricts the realization of a high etching rate is the removal of PbF2. Fluoride that remained on the surface could be removed by annealing after etching.
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