Abstract
Heavy-ion bombardment of thin ferromagnetic, polycrystalline films can induce substantial changes of their magnetic and microstructural properties. Since we first identified this effect in 50-150 nm thick Fe and Ni films irradiated with Xe-ions, we made a systematic search for the influence of various film and implantation parameters on the orientation and degree of the magnetic anisotropy and how these parameters correlate with the microstructure of the films. Several analyzing methods, such as Rutherford backscattering, magneto-optical Kerr effect, X-ray diffraction, magnetic force microscopy, 1 1 1 In perturbed angular correlation, and conversion electron Mossbauer spectroscopy, were employed in the investigation.
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