Abstract
Patterned Permalloy submicron-size structures have been fabricated by e-beam lithography in the shape of a ring with a tip. A tip was intentionally added into the ring as a geometrical defect to interrupt the continuity of the magnetization, which aligns along the ring, in order to pin the domain wall. Magnetic switching and reversal process have been measured by the magnetoresistance measurement. The switching field about 260 Oe was obtained. At the remanent state, there was a 0.21% difference in the magnetoresistance between the angles of 90° and 0° that was equivalent to the domain wall magnetoresistance. By applying an external field, the domain wall moved along the ring under a lower field (100 Oe), which is smaller than the switching field. A drop (0.24%) in the resistance between the angle of 70°–120° has been observed that means the domain wall was moving into the voltage measuring region during the rotation.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
