Abstract
Multilayer Ni-C films have been prepared using dc triode sputtering with a fixed C layer of 2 nm thick and with a Ni layer varying from 3 to 10 nm thick. The C layer is amorphous and the structure of the Ni layer is hexagonal for 3 nm thick but becomes fcc when the thickness is above 6 nm. The magnetization is strongly reduced which is attributed to the presence of nonmagnetic layers at each interface. These layers could be Ni3C. FMR indicates an easy perpendicular axis for t(Ni)>20 nm, but for t(Ni)<7 nm, the films develop an easy plane anisotropy. The Hc and the linewidth increases for t(Ni)<7 nm. Annealing at 473 K in vacuum leads to an increase in 4πM, indicating that C atoms are segregating out of the Ni layer and that the Ni film crystallizes better. The perpendicular anisotropy also develops strongly after annealing. The results are discussed.
Published Version
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