Abstract
Thin films of amorphous (GdTb)×(FeCo) 1−x of different thicknesses, h, were deposited in a HUV dc planar-magnetron getter sputtering system and characterised by Hall-effect magnetic hysteresis loops. Quantitative information was obtained on the coercity, the Hall resistivity and the normal electrical resistivity for a range of compositions. The coercive force, H c , was found to vary with thickness, h. This was interpreted as a consequences of the coarsening of the microstructure with increasing thickness in amorphous sputter-deposited films. A model us presented which enables a local pinning force per unit area to be deduced from the variation of H c with h. The roughness of the substrate was not a major cause of the domain wall pinning.
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