Abstract
Nickel film deposited on a (1 0 0) oriented silicon substrate was prepared at 110 °C by a simple chemical method under the application of a 0.3 T magnetic field. The prepared film possesses a shiny-silver surface and a strong binding ability develops between the film and the silicon surface. FESEM images show that the thickness of the film prepared under the application of an external magnetic field is 1.35 µm, which is thicker than that of the film synthesized without an external applied field: 0.80 µm. Magnetic measurement indicates that saturation magnetization Ms and the coercivity Hc of the sample prepared with an external magnetic field are 495 emu cm−3 and 65 Oe, which are higher than those of the other sample without a magnetic field applied (338 emu cm−3 and 48 Oe, respectively). It is suggested that relatively ordered magnetic structures induced by magnetic fields during preparation result in the enhancement of magnetic properties.
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