Abstract
This work reports the effect of Ar gas pressure PAr for Cr underlayer on the magnetic and microstructural properties of Co-Ni based double layered films, using Facing Targets Sputtering (FTS) apparatus. PAr for Cr underlayer was varied from 0.2 to 10 mTorr while PAr for magnetic layer was maintained 2 mTorr. Crystallinity and morphology of Cr underlayer depended on PAr and crystal orientation and magnetic properties of magnetic layer depended on PAr for Cr underlayer. Consequently, Crystallite orientation of magnrtic layer with 500 A-thick Cr underlayer depends on Ar gas pressure for Cr underlayer deposition and that Co(101) orientation of magnetic film depends on crystallinity of Cr underlayer and increases with increase of crystallinity.
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