Abstract
The CoWP film with good magnetic performance and corrosion resistance was electrolessly plated from alkaline solution. The technical parameters of the electroless plating system were optimized. When the pH value of electroless plating solution was 11.0 and the reducing agent (NaH2PO2) content was 0.4 mol·L−1, the target chemical reactions proceeded in the electroless plating solution smoothly with negligible interference and side effects. CoWP film prepared under optimal deposition condition contained more hexagonal close-packed (hcp) cobalt (ɛ-Co) of [110] and crystallographic orientation of Co [002]. VSM analysis reveals that the saturation magnetization of the CoWP film is 100∼220 Am2·kg−1 and coercivity is (2.87∼4.38)×104 A·cm−1. The corrosion behavior of CoWP film in 3.5% NaCl aqueous solution was studied by electrochemical experiments. The results prove that the corrosion resistance of the CoWP film deposited under the optimal deposition condition exhibites relatively lower corrosion current of (3.054∼3.162)×10−6 A·cm−2. The surface morphology analysis indicates that the film is smooth and composed of regular-shaped crystallites.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
