Abstract
Nanostructure oxide thin films have potential technological use due to their unique properties, diverse from those of similar polycrystalline materials. The use of an inorganic matrix as a nanocrystalline particle host allows uniform particle size, and homogeneous distribution and dispersion. Nickel and cobalt ferrite and ferrite composite thin films using silica matrix were prepared by sol-gel process using tetraethylorthosilicate (TEOS) as a precursor of silica, and metallic nitrates as precursors of ferrite. The films were prepared and deposited on various substrates using the dip- coating process. The films obtained were adherent, transparent, homogeneous and free of microcracks and presented crystalline NiFe2O4, CoFe2O4, NiFe2O4/SiO2 and NiFe2O4/SiO2 phases and other phases in minor proportion.
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