Abstract

We report the magnetic domain structure, and electrical and magnetoresistance properties of laser ablated Co40Fe40B20 (CoFeB) (6 to 36 nm) thin films deposited on SiO2 / Si(001) substrates. Magnetic force microscopy performed on annealed CoFeB thin films revealed larger magnetic domains, which are formed due to strong exchange coupling between the grains. The temperature-dependent sheet resistance of as-deposited thin films revealed that the observed non-metallic behavior is due to intragrain-tunneling and SiO2 inclusions in the amorphous matrix. The metallic behavior of annealed CoFeB thin films is due to electron scattering from grain boundaries and granularity correlated to the formation of nano-crystallites. Thickness and field-dependent magneto-transport studies show higher magnetoresistance values for thinner annealed CoFeB films due to more scattering events upon crystallization, which is consistent with the granular nature of the annealed thin films.

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