Abstract
This paper presents a new design for the magnetic field configurations in a polyvalent source which will allow cathodic arc and sputtering deposition processes from a rectangular target. The strength and direction, of magnetic fields are modelled by a software package, based on finite element analysis. In the sputtering magnetron mode, a high degree of parallelism of the magnetic field on the target surface is achieved, increasing the target erosion. Electromagnetic control of the cathodic arc spot will be done by coils alternately powered that create closed paths avoiding the spot fixation. Finally, the presented design is compared with a commercially available magnetron source. >
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
