Abstract
We investigated the modifications of the magnetostrictive properties of nickel thin films due to relaxation strains at the substrate/film and film/vacuum interfaces. The in-plane magnetization rotation induced by a mechanical applied strain varies with the depth in the film. In nickel thin films submitted to strains of 3 × 10 −4 (expressed in relative deformation) the magnetization rotation is shown to be of 55° at the vacuum/film and substrate film interfaces whereas it goes up to 65° in the middle of the film. These magnetic depth profiles were measured by polarized neutron reflectometry with polarization analysis.
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