Abstract
We present a study of Ar ion milling-induced damage in exchange biased IrMn/CoFe/Ag-based magnetic multilayer thin films. While process variations determine the change in CoFe magnetic properties, the distance from the ion milling front to the IrMn/CoFe interface dominates the extent of exchange bias damage. Remarkably, the interfacial coupling energy Jk can be reduced by 50% before any removal of the CoFe pinned layer. We attribute the losses to microstructural changes and damage effects where cap material is driven into the CoFe layer below. Disturbance depth estimates from ion impact simulations agree reasonably with the observed length scales of damage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.