Abstract
Co 2 Fe Si films were prepared using magnetron sputtering technique on Cr buffer layers and MgO(001) substrates at various annealing temperatures. We investigated the crystal structures, magnetic properties (Ms and Hc), surface roughness, and magnetic damping constants (α) of the prepared Co2FeSi films. Out-of-plane angular dependences of the resonance field and the linewidth of the ferromagnetic resonance spectra were measured and fitted using the Landau-Lifshitz-Gilbert equation to determine the damping constant. The as-deposited Co2FeSi film exhibited an amorphous and disordered structure; the α value was 0.008. In contrast, the Co2FeSi films annealed over 300°C showed epitaxial growth and had a (001)-oriented and L21 ordered structure. Both disordered and L21 ordered Co2FeSi films showed similar α values.
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