Abstract

Cobalt-iron thin film was deposited on rotating silicon (100) substrate using the DC-magnetron sputtering deposition unit. The structure is examined by Grazing Incidence X-ray Diffraction and results reveal that the sample has a bcc crystal structure with lattice constant 2.65 Å. The X-ray Reflectivity data analysis confirms that the thickness of the thin film alloy is about 33 nm. The Energy Dispersive X-ray Analysis confirms the presence of 30.56% of cobalt and 69.44% of iron in cobalt-iron thin film. The study of magnetic properties by Magneto-Optic Kerr Effect technique suggests that sample exhibits soft magnetic behavior. The M–H loop study shows that the coercive field decreases with the increase of rotation of the substrate which may be due to reduced grain size or crystal orientation. The study of remanence magnetization (Mr/Ms) confirms that the sample has a twofold magnetic structure and cubic magnetic anisotropy. The occurrence of the magnetization reversal in the sample is due to the formation of the ripples and change in the contrast in the color of domain images along the easy axis and through coherent rotation of spins along the hard axis. This confirms that the sample has uniaxial nature and found very useful applications in the magnetic sensors, memory storage devices and spintronics.

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