Abstract
Fe/Si multilayered films were deposited by using a dual ion-beam sputtering apparatus, and the effect of Ar ion bombardment during deposition on the structure, internal stress, and magnetic properties was investigated. For the films without ion bombardment, tensile stress was induced in the Fe layers. On the other hand, for those with ion bombardment, compressive stress was induced in the Fe layers, and coercivity became as low as about 6 Oe. Consequently, Ar ion bombardment is effective to get soft magnetism for the multilayered films because of changing the structure and internal stress.
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