Abstract
Ti 1-x V x O 2-δ (x = 3 at.%, 10 at.% and 18 at.%) films on either LaAlO3 or rutile TiO2 substrates have been grown by RF magnetron sputtering of metallic alloy targets in the argon–oxygen atmosphere. The grown films revealed the room temperature ferromagnetic ordering in the whole range of studied resistivity (10-3–106 Ω ⋅ cm). The maximal magnetization up to 42 emu ⋅ cm-3 has been observed in the films with 3% of vanadium. The V impurity was entirely in the oxidized state only in the films with small V concentration. The magneto-optical response in the 1.5–3 eV energy range has been observed only in certain samples with a high magnetization.
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