Abstract
This work presents, as a function of deposition parameters, the comparative measurements performed on thin magnetic films (0.06–0.6 μm) of Ni 81Fe 19 and Ni 80Fe 15Mo 5 deposited by r.f. plasma sputtering. Magnetic measurements were performed using an alternating-gradient magnetometer. Electrical characterization consisted basically of resistivity measurement. For as-deposited thin films, we measured the influence of the deposition parameters, thickness and sample shape (which is a way to characterize the demagnetising field). We obtained typical values for saturation magnetization, in the range of 0.6–0.8 T, independent of deposition parameters. The coercive field lies in the range of 3–80 Am −1 for as-deposited films. The electrical resistivity of as-deposited films is around 65 μΩ cm for NiFeMo and 20 μΩ cm for NiFe. Measurements were also carried out on thin films annealed at different temperatures under an external magnetic field. We observe the magnetic anisotropy in the film plane. The coercive field of annealed films increases up to 1300 A m −1. We also present a comparative study of as-deposited and annealed materials.
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