Magnesium/nitrogen and beryllium/nitrogen coimplantation into GaN

Abstract

The nitrogen coimplantation characteristics in the Mg- and Be-implanted GaN with different dopant concentration ratios have been systematically investigated. The Hall-effect measurements show that the p-type characteristics are produced in the Mg- and Be-implanted GaN by the coimplantation of N atoms and subsequent annealing, which is essentially related to the column II/V dopant concentration ratio and annealing condition. This behavior may be attributed to the reduction of self-compensation induced by N vacancies and the enhanced acceptor substitution, which is in reasonable agreement with the surface stoichiometric switching determined by x-ray photoelectron spectroscopy measurements. From photoluminescence data, the activation energy of the Be acceptor level is evaluated to be about 145meV, which is shallower than that of the Mg acceptor. These experimental results indicate that the selective-area N coimplantation with Mg and Be atoms into GaN is an effective method to enhance the p-type conductivity and to improve the p-type Ohmic contact resistance.