Abstract
We have studied the composite nanoperiodic (3-8 nm) SiOx/Al2O3 structures fabricated by physical deposition from separate sources. The structures annealed in nitrogen atmosphere at 900–1100 °C included Si-NCs that showed intense room-temperature photoluminescence at 1.6 eV. The quantum-confinement peak shift was observed under varying the SiOx layer thickness. Up to fourfold intensity enhancement was observed after hydrogenation of the structures in the range of 400–450 °C for 2 hours.
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