Abstract
High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 micrometer are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful design flexibility at several energy regimes.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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