&lt;title&gt;Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;3&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;N&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;4&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;, Nb&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;2&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;O&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;5&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;, And Ta&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;2&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;O&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;5&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt; Optical Thin Film Waveguides&lt;/title&gt;

S Dutta,H E Jackson,J T Boyd

doi:10.1117/12.933213

<title>Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si<formula><inf><roman>3</roman></inf></formula>N<formula><inf><roman>4</roman></inf></formula>, Nb<formula><inf><roman>2</roman></inf></formula>O<formula><inf><roman>5</roman></inf></formula>, And Ta<formula><inf><roman>2</roman></inf></formula>O<formula><inf><roman>5</roman></inf></formula> Optical Thin Film Waveguides</title>

S Dutta, H E Jackson + Show 1 more

https://doi.org/10.1117/12.933213

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Publication Date: Aug 27, 1982

Citations: 1

Affiliation: University of Cincinnati

#Laser Anneal #Society For Engineering + Show 8 more

Abstract
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Abstract

We report consiaerabe success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally-oxidized silicon substrates. For the materials Si 3N4, Nb90,, and Ta205 values of waveguide loss less than 1 oB/cm were achieved. Values of waveguide loss as1UW as'.01 db/cm nave been measured for laser-annealed Zn0 waveguides and for Corning 7059 glass wave-guides which have been both laser anneal ea and had surface coatings applied.© (1982) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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