Abstract

Compact short pulse (200 - 350 ps) laser systems using SBS and SRS pulse compression techniques have been constructed. Fine processing of aluminum nitride and silicon wafer has been studied by using these laser pulses and compared with the results processed by 60 femto second laser system. Through-holes are formed on wafers by irradiation of the laser pulses, and the relationship between hole shapes and the processing conditions has been studied. The hole shape relates with the focusing length of the lens, laser fluence, pulse width and the wave length. Trepanning technique has been examined also to improve the hole shape. The result is quite.

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