&lt;title&gt;Sol-gel derived Si0&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;2&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt;:Ti0&lt;formula&gt;&lt;inf&gt;&lt;roman&gt;2&lt;/roman&gt;&lt;/inf&gt;&lt;/formula&gt; films for applications in optoelectronics&lt;/title&gt;

Paweł Karasiński

doi:10.1117/12.739572

<title>Sol-gel derived Si0<formula><inf><roman>2</roman></inf></formula>:Ti0<formula><inf><roman>2</roman></inf></formula> films for applications in optoelectronics</title>

Paweł Karasiński

https://doi.org/10.1117/12.739572

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Publication Date: Apr 7, 2007

Citations: 3

Affiliation: Silesian University of Technology

#Films Of High Refractive Index #Films Of Refractive Index + Show 8 more

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Abstract

The paper presents silica films of the refractive index 1.267-1.420 and silica-titania films of high refractive index 1.762. Basic fabrication technology was presented as well as the applied measurement methods of refractive index and thickness. The paper provides examples for the application of the elaborated technology for the fabrication of waveguide films, input/output grating couplers and channel RIB waveguides.

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