Abstract
ABSTRACT Silica based planar waveguides co-doped with Er3, Ti02 and Al203 have been fabricated on SOS (silica on silicon) by asol-gel process using multiple spin-coating and rapid thermal processing (RTP). Their characteristics, such as refractiveindex, thickness photoluminescence (PL), FuR (Furior Transform infrared spectrum), XRD (X-ray diffraction), and surfaceroughness are investigated. The relatively strong PL emitted from planar waveguide has been got using the recipe of93SiO2 : 7TiO2 : OAl2O3 : 0.5 Er203 (mole ratio). The presence ofO2 during annealing in RTP is indispensable for sol-gelwaveguide to guide light. Both the average refractive index and thickness of multilayer film increase as the layer numberincreases.Keywords: Sol-gel process, Er-doped Planar waveguides, Photoluminescence I . INTRODUCTION In recent years, the sol-gel process has attracted considerable interest for the fabrication of integrated optical devicesbecause of its advantages. By the sol-gel process, it is very easy to tailor the material composition to realize differentmaterial functions. A good example is the ease to dope various rare earth ions for planar or channel waveguide amplifierand laser applications'. The process is also very flexible as the final materials can be made in the form of bulk, film, power
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