Abstract
This paper describes the design and applications to optical processing and recording of a Scanning Near-field Optic/Atomic-force Microscope (SNOAM). A sharpened and bent optical fiber was used as a near-field optical probe as well as an atomic force microscope probe in a vertical vibrating mode. SNOAM provides simultaneous topographical and optical images with high resolution beyond the diffraction limit. As an example of an application to optical processing, near-field exposures have been demonstrated by a SNOAM. We produced pit and line patterns exposed and developed in commercial photoresist film. In the processing mode, the pit and line patterns down to a width of 100 nm have been fabricated on a Si wafer through the Integrated Circuits process.
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