Abstract
Collinear irradiation system of VUV-UV multiwavelength excitation process using F2 and KrF excimer lasers has been developed. This system achieves high-quality ablation of fused silica. In addition, dependence of ablation rate on various conditions such as laser fluence, delay time of each laser irradiation, and pulse number is investigated. Multiwavelength excitation effect is strongly affected by the delay time and extremely high etching rate over 30 nm/pulse is obtained during -10 ns to 10 ns of the delay time. KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing simultaneously irradiated F2 laser fluence.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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