Abstract
Soft x-ray projection lithography (SXPL) requires uniform, high reflectivity multilayer (ML) coatings on figured optical surfaces with lens speeds (f) between 3 and 6 and diameters of 10 to 15 cm. High reflectivity Mo-Si ML coatings for operation near 13 nm were deposited on f 3.4 and f 6 optics 5 and 7.5 cm in diameter using planar dc magnetron sputtering. Measurements of the normal incidence reflectivity (NIR) of 63% at 13 nm uniform over the central 5 cm of the figured surface were obtained. Comparison of the measured values to model calculations of the wavelength dependent reflectivity indicate that the ML period is uniform to better than 0.04 nm over this region.
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