Abstract
Recent advances in computer hardware and software have provided the capability to simulate complex mixtures of compounds on a molecular level. These tools provide the potential for exploration of resist chemistry and mechanism on a molecular level with visual feedback. However, there are still limitations of software and hardware and time which require simplification of the simulations. Thus extensive methods development will be required to be able to produce simulations useful to predict resist properties. This paper discusses the basics of photoresist molecular simulation techniques, limitations of the current techniques, and the potential for using molecular simulations to explore various aspects of photoresist performance, particularly novolac-novolac and novolac-diazonaphthoquinone photoactive compound (DNQ PAC) hydrogen bonding.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
