Abstract
Moire alignment and overlay measurement techniques with nm-scale precision are demonstrated. Using 0.47-micrometers pitch gratings, a 1-nm alignment resolution is demonstrated. A novel double-period moire grating is used to provide both coarse (approximately 10 micrometers ) and fine (approximately 1 micrometers ) capture ranges for integration with existing stage positioning systems. A new diffraction-order interferometry technique for nm-precision remote overlay readout, with potential application to latent image structures immediately after exposure, is demonstrated.
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