<title>Fabrication of micro-optical components by laser beam writing in photoresist</title>

Abstract

A laser beam writing system for the fabrication of micro-optical elements as relief structures in photoresist is described. Using a computer controlled precision xy stage and a modulated, focused laser beam, a wide range of surface relief microstructures has been produced, with typical periods of 10 - 100 micrometers and a maximum relief amplitude of about 5 micrometers . Examples include microlens arrays, kinoforms and other phase structures for applications in optical computing, optical interconnects and micro-optical systems in general.