<title>EUV spectrometric facility with laser-focus plasma radiation source</title>

Abstract

A spectrometric facility for measurements of reflection, absorption and excitation spectra of films and massive samples in 50 to 300 nm wavelength region with the spectral resolution up to 10<SUP>3</SUP> is designed and tested. Plasma produced EUV radiation from the laser beam focused onto a gaseous or a solid target makes it possible to achieve the spectral intensity on a sample up to 3(DOT)10<SUP>6</SUP> photons/s(DOT)cm<SUP>-1</SUP>. Application to measurement of reflection spectra of some phthalocynines is reported here.