Abstract
Radiation hardness is critical for charge coupled devices used in the electron bombarded mode. Two types of damage in CCDs are caused by keV electron irradiation: a flatband voltage shift and an increase in interface state density. A flatband voltage shift is more catastrophic to device performance than an increase in interface state density, especially for MPP devices. The type of radiation damage a CCD is susceptible to depends on the process used to fabricate it. Results are presented which show that Tektronix CCDs fabricated with a straight silicon dioxide gate insulator exhibit an increase in interface state density but little if any flatband voltage shift.
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