Abstract
Radiation hardness is critical for charge coupled devices used in the electron bombarded mode. Two types of damage in CCDs are caused by keV electron irradiation: a flatband voltage shift and an increase in interface state density. A flatband voltage shift is more catastrophic to device performance than an increase in interface state density, especially for MPP devices. The type of radiation damage a CCD is susceptible to depends on the process used to fabricate it. Results are presented which show that Tektronix CCDs fabricated with a straight silicon dioxide gate insulator exhibit an increase in interface state density but little if any flatband voltage shift.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
