Abstract
In this paper, a close analogy between the theoretical model of forming the profile of a diffractive relief structure in photoresist during development and equations of geometrical optics is shown. It is used for the investigation of evolution of the grating profile arising in a positive photoresist layer which was exposed to the interference field of two laser beams. Verification of theoretical conclusions is based on comparison of theoretical and experimental time dependences of diffraction efficiencies of many orders during development. A SEM photography of the relief of a produced grating sample is presented as well. A short section is devoted to diffraction properties of the structures under study with emphasis on their possible applicability to multiple beam splitting.
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