Abstract

Plasma assisted chemical etching (PACE) and ion milling (IM), originally developed for microelectronic fabrication, are now finding a new use to shape (figure) and smooth (polish) optical and other surfaces without mechanical contact. Using a recent theory of the temporal evolution of surfaces during arbitrary additive or subtractive processes, the predicted and observed smoothing of PACE and IM are critically compared in this paper to provide insight into their fundamental behavior© (1992) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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