Abstract
Four- and eight-level diffractive optical elements (DOES) are fabricated in silicon using electron beam lithography and reactive ion etching. An f/1.9. 1-mm diameter, four-phase level, reflective off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first-order efficiency of the DOE is 73%. Eight-level linear gratings are fabricated to determine processing tolerances for DOEs with first order-diffraction efficiencies greater than 90%.
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