Abstract
AbstractThe research results of silicon dioxide thin films alignment properties is presented. The films was deposited by oblique ion beam sputtering on glass substrate. Films thickness and angle condensation influences on the value of pretilt angle of liquid crystal vertical alignment mode is shown. Role of the surface morphology of alignment layers is discussed. The highly uniform vertical alignment layers can be produced using ion beam coating on the substrates with dimensions 300 × 400mm and more.
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